Dust behavior analysis software "DSMC-Neutrals"
"Dust behavior affecting contamination" analysis supported by the rarefied fluid analysis software 'DSMC-Neutrals'
Simulation Analysis of Dust Behavior Affecting Contamination Initially compatible with various simulations 【Features】 ■ By adopting unstructured meshes, it is possible to compute the exact shape of complex actual devices. ■ High parallel efficiency allows for quick computation results even for large-scale shapes. ■ Since a particle method is used, unlike fluid models, convergence solutions can be obtained even with poor quality computational grids. ■ With comprehensive technical support, even those new to simulations or busy with experiments can reliably achieve results. ◆ Compatible with various cases ◆ - Simulation of rarefied gas flow in a vacuum chamber - Simulation of thin film generation in semiconductor manufacturing - Simulation of thin film generation in semiconductor manufacturing such as Chemical Vapor Deposition (CVD), Organic Light Emitting Diodes (OLED), and Molecular Beam Epitaxy (MBE) ◆ Outputs various computational results ◆ - Calculation of chemical reactions - Calculation of chemical reactions from Arrhenius-type reaction data - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions - Multiple reaction equations can be set up on the GUI *We also conduct contract analysis, so please feel free to contact us.
- Company：ウェーブフロント 本社
- Price：Other
